Products & Service
TASMIT, Inc. covers development, manufacturing and sales for the geometry verification system that achieves 2 dimensional metrology and inspection for pattern defects that cause the decrease of the yield on the leading-edge semiconductor device manufacturing.
TASMIT, Inc. was founded in July, 2000 to create the geometry verification system based on our original concept.
The node of semiconductor devices has reached beyond 10 nm in these years. 3 dimensional devices have also been in mass production phase for achieving high density structure.
As these devices have become high-density and 3 dimensional, requirements for inspection and metrology needed to manage the yield are getting severe.
TASMIT, Inc. has created the geometry verification system based on Die to Database algorithm that compares design data with SEM images in 2000 ahead of the world. And we have proposed the new method to manage the yield with 2 dimensional mass CD measurement. We are developing the next generation wafer geometry verification system to meet the requirements for inspection and metrology involved in the progress of semiconductor devices.