Microlithography World Feb 2006

Douglas J. Resnick, Ecron Thompson, L. Jeff Myron, Gerard M. Schmid

Molecular Imprints Inc., Austin, Texas

Abstract

Over the last 30 years, many different varieties of next generation lithography (NGL) have been proposed as successors to optical lithography, but the continued extension of that technology – combined with the lack of a commercial NGL mask infrastructure – made it extremely difficult for any NGL to penetrate the silicon market. How will imprint lithography avoid sharing the fate of the others?